报告人：余备教授
报告时间：2024年12月13日16:30--17:30
报告地点：科技园阳光楼南815
报告主题：Large Language Model in EDA
报告摘要：
In this talk, we explore the burgeoning intersection of Large Language Models (LLMs) andElectronic Design Automation (EDA). We critically assess whether LLMs represent a transformative future for EDA or merely a fleeting mirage. By analyzing current advancements, challenges, and potential applications, we dissect how LLMs can revolutionize EDA processes like design, verification, and optimization. Furthermore, we contemplate the ethical implications and feasibility of integrating these models into EDA workflows. Ultimately, this talk aims to provide a comprehensive, evidence-based perspective on the role of LLMs in shaping the future of EDA.
报告人简介：
Prof. Bei Yu is currently an Associate Professor in the Department of Computer Science and Engineering, The Chinese University of Hong Kong. He has served as TPC Chair of ACM/IEEE Workshop on Machine Learning for CAD, and in many journal editorial boards and conference committees. He received eleven Best Paper Awards from ICCAD 2024 & 2021 & 2013, IEEE TSM 2022, DATE 2022, ASPDAC 2021 & 2012, ICTAI 2019, the VLSI Journal in 2018, ISPD 2017, SPIE Advanced Lithography Conference 2016, and eight ICCAD/ISPD contest awards. He received IEEE CEDA Ernest S. Kuh Early Career Award in 2021, ACM SIGDA Meritorious Service Award in 2022, DAC Under-40 Innovator Award in 2024, and Hong Kong RGC Research Fellowship Scheme (RFS) Award in 2024.
